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The Center for Contemporary Printmaking’s Footprint International 2016, is an opportunity for the presentation of current trends and innovations in contemporary printmaking within the bounds of the one square foot (12” x 12”) configuration. The square format was uncommon in art until the advent of abstraction and presents distinct challenges of composition and expression. Within these precise limits, artists must confront a space and create visual order and formal structure.
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Andrew Stein Raftery is a printmaker specializing in narrative scenes of contemporary American life. Trained in painting and printmaking at Boston University and Yale, he has focused on burin engraving for the past 12 years, publishing the portfolios Suit Shopping in 2002 and Open House in 2008. In 2003 Raftery received the Louis Comfort Tiffany Award, and in 2008 he was a fellow of the John Simon Guggenheim Memorial Foundation. He was elected to membership in the National Academy in 2009. Andrew is a professor of printmaking at Rhode Island School of Design.
Entry Deadline: March 12, 2016
Jury Notification: 
April 9, 2016
Exhibition Dates: June 5 – August 28, 2016